The composition and manufacture of resist pattern

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PROBLEM TO BE SOLVED : To provide a resist composition that enables production of a resist pattern with excellent line edge roughness.SOLUTION : A resist composition contains a resin that includes a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not include an acid-labile group, a resin including an acid-labile group, and an acid generator including an alkali-labile group, wherein Rand Rare a hydrogen atom or a methyl group; Ris an alicyclic hydrocarbon group; Lis a divalent saturated hydrocarbon group or a single bond; and Ris a saturated hydrocarbon group including a fluorine atom.