Photoresist composition, a resist pattern forming method, polymer and compound

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PROBLEM TO BE SOLVED : To provide a photoresist composition which is excellent in LWR performance, CDU performance, resolution, rectangularity of the cross-sectional shape, depth of focus, exposure margin and MEEF performance.SOLUTION : A photoresist composition contains a polymer having structural units containing a group of formula (1) and a radiation-sensitive acid generating agent. In formula (1), Rand Rare each independently a hydrogen atom or a 1-20C monovalent organic group, and at least one of Rand Ris a 1-20C monovalent organic group. The monovalent organic group of Rand Ris preferably an acid-dissociative group.