POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE AND POLISHING METHOD FOR SYNTHETIC QUARTZ GLASS

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PROBLEM TO BE SOLVED : To provide a polishing agent for a synthetic quartz glass substrate that has a high polishing rate and can sufficiently reduce the occurrence of faults due to polishing. SOLUTION : A polishing agent for a synthetic quartz glass substrate has a polishing particle and water, the polishing particle having a ceria particle as a matrix particle, the matrix particle carrying, on its surface, a complex oxide particle of cerium and at least one rare earth element selected from other trivalent rare earth elements other than cerium. SELECTED DRAWING : Figure 2 COPYRIGHT : (C)2018, JPO&INPIT