CERIUIM-BASED ABRASIVE MATERIAL AND PROCESS FOR PRODUCING SAME

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Provided are : a cerium-based abrasive material which is inexpensive and has excellent production efficiency and which, when used in polishing the surface of, for example, a glass substrate, has a high polishing rate and is effective in inhibiting the surface being polished from having surface defects such as scratches or pits or from suffering adhesion of abrasive-material grains; and a process for producing the abrasive material. The cerium-based abrasive material comprises cubic composite rare-earth oxides and composite rare-earth oxyfluorides, wherein all the rare-earth elements are contained in an amount of 95.0-99.5 mass% in terms of oxide amount, the contents of cerium, lanthanium, and neodymium being 54.5-95.0 mass%, 4.5-45.0 mass%, and 0.5-2.0 mass%, respectively, in terms of oxide amount with respect to all the rare-earth elements in terms of oxide amount. The abrasive material further contains fluorine atoms in an amount of 0.5-4.0 mass% and contains sodium atoms in an amount of 0.001-0.50 mass% with respect to all the rare-earth elements in terms of oxide amount.