The salt and resist composition

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PROBLEM TO BE SOLVED : To provide a salt for an acid generator of a resist composition capable of forming a pattern having excellent line edge roughness.SOLUTION : The salt is expressed by formula (I) [in formula (I), Rand Rare each a fluorine atom or perfluoroalkyl; Ris a hydrogen atom; Xis a bivalent saturated hydrocarbon group, wherein the hydrogen atom in the group may be substituted with a fluorine atom, and -CH- in the group may be substituted with -O- or -CO-; Xis a single bond or alkylene, wherein -CH- in the group may be substituted with -O-, -NH- or -CO-; Ris a cyclic hydrocarbon group, wherein the hydrogen atom in the group may be substituted with 1-4C alkyl, hydroxyl, a halogen atom or amino; and Zis an organic cation].