Photoresist composition and a method for forming a resist pattern

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PROBLEM TO BE SOLVED : To provide a photoresist composition excellent in sensitivity and resolution and sufficiently suppressing the nano edge roughness of film surface of an obtained pattern, and a resist pattern formation method using the photoresist composition.SOLUTION : A photoresist composition contains [A] a polymer having a structural unit (I) expressed by formula (1), and [B] an acid generator. In the formula (1), it is preferable that Rand Rare not bonded to each other.