PLASMA EROSION RESISTANT RARE-EARTH OXIDE BASED THIN FILM COATINGS

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A chamber component for a process chamber comprises a ceramic body and one or more protective layer on at least one surface of the ceramic body, wherein the one or more protective layer comprises Y3Al5O12 having a dielectric constant of 9.76+/−up to 30% and a hermiticity of 4.4E-10 cm3/s+/−up to 30%.