含镧系元素前驱物的制备和含镧系元素薄膜的沈积

文件类型：PDF文档
文件大小：1376K
本文描述沈积含稀土金属层之方法及组成物。一般而言，所揭示之方法使用诸如化学气相沈积或原子层沈积之沈积方法沈积包含含稀土化合物之前驱化合物。所揭示之前驱化合物包括具有至少一个脂族基作为取代基之环戊二烯基配位基及脒配位基。 Methods and compositions for depositing rare earth metal-containing layers are described herein. In general, the disclosed methods deposit the precursor compounds comprising rare earth-containing compounds using deposition methods such as chemical vapor deposition or atomic layer deposition. The disclosed precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent and an amidine ligand.