分享好友 知识库首页 频道列表

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

2026-04-05 07:191890下载
文件类型：PDF文档
文件大小：841K
A semiconductor structure and a method for forming the same are provided. The semiconductor structure comprises : a semiconductor substrate; a trench formed in the semiconductor substrate, in which a rare earth oxide layer is formed in the trench; a channel region partly or entirely formed on the rare earth oxide layer; and a source region and a drain region formed at both sides of the channel region, respectively. A relationship between a lattice constant a of the rare earth oxide layer and a lattice constant b of a semiconductor material of the channel region and/or the source region and the drain region is a=(n±c)b, where n is an integer, c is a mismatch ratio of lattice constants, and 0
反对 0
举报 0
收藏 0
打赏 0
评论 0