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A rare-earth-containing glass material having a composition, expressed in mole percentages on an oxide basis, comprising : SiO2 66-75%, Al2 O3 11-17%, B2 O3 0-4%, MgO 1-6.5%, CaO 2-7%, SrO 0-4%, BaO 0-4%, Y2 O3 0-4%, La2 O3 0-4%, Y2 O3 +La2 O3 0.1-4%. The inclusion of Y2 O3 and/or La2 O3 in the composition reduces the T2.3 of the glass thereby allowing higher annealing-point glasses to be produced. The glass is particularly useful for low-temperature polycrystalline silicon-based semiconductor devices.