Semiconductor device

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PROBLEM TO BE SOLVED : To provide a dense insulation film with high withstanding voltage. SOLUTION : A semiconductor device includes a semiconductor film on a substrate, a first insulation film on the semiconductor film, a conductive film on the first insulation film, and a second insulation film on the conductive film. The first insulation film is denser than the second insulation film, and contains silicon, oxygen, and nitrogen. The first insulation film contains rare gas, and has a thickness of 1 nm or more and 100 nm or less. The insulation film functions as a gate insulation film. COPYRIGHT : (C)2013, JPO&INPIT