POLISHING PAD

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PROBLEM TO BE SOLVED : To provide a polishing pad whose temporary retaining force for an abrasive material used for polishing a lens, silicon wafer, glass substrate, etc. is improved to reduce an amount of use of a rare earth substance (rare metal), such as cerium, and improve polishing efficiency. SOLUTION : The polishing pad 1 is made by applying or impregnating a nonwoven fabric base material 2 composed of fiber with an epoxy resin 3 with (A) hardness of 70 to 100, or by using the nonwoven fabric base material 2 where an epoxy group is contained in the its surface. COPYRIGHT : (C)2012, JPO&INPIT