PLASMA ETCHING APPARATUS MEMBER HAVING IMPROVED PLASMA-RESISTANT PROPERTIES AND MANUFACTURING METHOD

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The present invention relates to a plasma etching apparatus member and a manufacturing method therefor and, more specifically, to : a plasma etching apparatus member, which improves plasma-resistant properties through deposition of rare earth metal thin film and surface heat treatment, and maintains light transmittance so as to be usable as a member for analyzing the end point of an etching process; and a manufacturing method therefor.