铝基合金溅镀标靶材料之制造方法

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Provided is a method whereby it is possible to manufacture, at a high yield, Al-based alloy sputtering targets containing rare-earth elements and high-melting point elements having a higher melting point than Al. The method comprises a step of preparing a first powder of an Al-based alloy which contains rare-earth elements manufactured by an atomization method, a step of mixing the first powder and a second powder comprising at least one type of high-melting point element (X) having a higher melting point than Al, and a step of increasing the density of the powder mixture of the first powder and the second powder. In the mixing step, the maximum particle size (a) of the first powder is 10 to 200 mm; the maximum particle size (b) of the second powder is 10 to 150 mm; and the ratio (a)/(b) of the maximum particle size (a) of the first powder to the maximum particle size (b) of the second powder is 0.5 to 5.