Water vapor film and silicon substrate using a hydrogen gas separation material and method of manufa

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PROBLEM TO BE SOLVED : To provide a silicic film having steam-proofness in high temperature and steam atmosphere, a hydrogen gas separation material using the film, and production methods of them. SOLUTION : The steam-proof film contains R (a rare earth element), Si, and O and has Si-O bond. The film can suppress a permeation of carbon monoxide gas and can be used as the hydrogen separation film. The production method of the steam-proof film comprises steps of applying a solution containing a compound containing R and an alkoxysilane compound for forming a film and heat-heating the film. After the heating treatment, the film may be heated in atmosphere containing steam. The hydrogen gas separation material comprises a porous substrate and the steam-proof film formed in one face side of the porous substrate. The production method of the hydrogen gas separation material comprises applying a solution containing a compound containing R and an alkoxysilane compound for forming a film and heating the film. COPYRIGHT : (C)2006, JPO&NCIPI