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PROBLEM TO BE SOLVED : To provide a dummy wafer that prevents thinning of a semiconductor wafer during cleaning or stabilizing operation of plasma etching system or plasma deposition system, and which has a long lifetime.
SOLUTION : A wafer has a rare earth fluoride coating on a substrate as an outermost layer, the rare earth fluoride being selected from among lanthanoid fluoride, yttrium fluoride, and scandium fluoride.
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