PRODUCING METHOD AND USE OF CRYSTALLIZED METALLIC OXIDE THIN FILM

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PURPOSE : A method of manufacturing a crystallized metal oxide thin film and usage thereof are provided to make a phosphor thin film material of high performance by forming the crystallized thin film containing Y2O3 on a substrate. CONSTITUTION : An organic metal thin film or a metal oxide film containing at least one type of rare-earth metal element selected from a group comprised of Y, Dy, Sm, Gd, Ho, Eu, Tm, Tb, Er, Ce, Pr, Yb, La, Nd and Lu formed on a substrate is retained in at a temperature of 25 to 600 deg.C. The organic metal thin film or the metal oxide film is crystallized while irradiating ultraviolet radiation having a wavelength of 200 nm or less. The organic metal thin film or the metal oxide film is prepared by sputtering, MBE(Molecular Beam Epitaxy), vacuum deposition, CVD, or a chemical solution deposition method. © KIPO 2008