Sputtering target for forming thin phosphor film

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A sputtering target for fluorescent thin-film formation comprising a matrix material and a luminescent center material, wherein said matrix material has a chemical composition represented by the following formula (1), and simultaneously satisfies conditions represented by the following inequalities (2) to (5). [in-line-formulae]MIIvAxByOzSw   (1)[/in-line-formulae][in-line-formulae]0.05≦v/x≦5   (2)[/in-line-formulae][in-line-formulae]1≦y/x≦6   (3)[/in-line-formulae][in-line-formulae]0.01≦z/(z+w)≦0.85   (4)[/in-line-formulae][in-line-formulae]0.6≦(v+x+3y/2)/(z+w)≦1.5   (5)[/in-line-formulae] wherein MII represents one or more elements selected from the group consisting of Zn, Cd and Hg, A represents one or more elements selected from the group consisting of Mg, Ca, Sr, Ba and rare earth elements, B represents one or more elements selected from the group consisting of Al, Ga and In, and v, x, y, z and w each represent numerical values satisfying the conditions specified in the inequalities (2) to (5).