Piezoelectric thin section element for acoustic resonators

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A thin film piezoelectric device has an epitaxial metal thin film (4) on a silicon substrate (2) and a PZT thin film (5) on the metal thin film, the PZT thin film (5) having a Ti/(Ti+Zr) atomic ratio between 0.65 and 0.90. Preferably the metal film (4) comprises at Pt group metal and is formed on an oriented faceted buffer layer (3) comprising zirconium oxide and/or rare earth oxide. A film bulk acoustic resonator having an extremely broad band is realized.