PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

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PROBLEM TO BE SOLVED : To provide a plasma processing device capable of executing a process with high reliability, and a plasma processing method. SOLUTION : The plasma processing device generates discharge plasma by impressing alternating electric field between paired electrodes under atmospheric pressure or neighborhood thereof, and makes the excited gas generated in the plasma act on a base material to be processed by blowing the excited gas thereon. First and second passages for exciting main discharge gas composed of rare gas, blowing the excited main discharge gas, and a control means for controlling a state of oxygen in a space located between a gas blow out part of the first passage and that of the second passage, are provided. COPYRIGHT : (C)2007, JPO&INPIT