Precursors for chemical vapour deposition comprising metal & ligand with co-ordinating N & O, separ

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Group 3B, 4B and rare earth metal precursors for chemical vapour deposition comprise the metal and at least one ligand having oxygen and nitrogen available for co-ordination with the metal, the oxygen and nitrogen being separated by 2 or 3 carbon atoms in the ligand and having sterically hindering groups on the nitrogen and/or the oxygen and/or a carbon adjacent to nitrogen and/or oxygen. A preferred ligand is the donor functionalised alkoxy ligand 2-(4, 4-dimethyloxazolinyl)- propan-2-olate, [NC(CH3)2CH2OCC(CH3)2O] (abbrev.'dmop').