NOVEL THIOSILICATE PHOSPHOR COMPOSITIONS AND DEPOSITION METHODS USING BARIUM-SILICON VACUUM DEPOSITI

文件类型：PDF文档
文件大小：949K
The present invention relates to novel thiosilicate phosphor compositions. The invention is further a physical vapor deposition method for the deposition of rare earth activated thiosilicate phosphor compositions comprising providing at least one or more source materials where the source materials may comprise a barium silicon alloy, an intermetallic barium silicon compound, a protected barium metal and combinations thereof; providing an activator species; and effecting deposition of the one or more source materials and activator species as a thin film phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.