The device and method of coating a substrate within a vacuum chamber

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In an apparatus for coating a substrate 8, comprising sputtering cathodes 4, 5 in a vacuum chamber 1, sputtering targets 6, 7, a medium-frequency generator 9 connected to the cathodes 4, 5 and a device 16 for detecting and suppressing undesirable electrical arcs, each halfwave of the medium-frequency signal of the generator 9 is subdivided into a multiplicity of time periods, the values of current and voltage being measured for a predetermined time period in order to form an actual value and inputted into earth-free measuring device 16, which is incorporated as remote station in a loop 9, 16, 17, 18, 19, 11, whose master station is disposed in control unit 11. The generator 9 is disabled, if an arc occurs, via line 19 which connects the measuring device 16 to the generator, 9 for which purpose arc-monitoring and measurement-acquisition parameters are set via lines 17, 18, 19 with the aid of software.