POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND METHOD O

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PROBLEM TO BE SOLVED : To provide a polishing agent for a synthetic quartz glass substrate having high polishing speed, and enabling the occurrence of defect caused by polishing to be sufficiently reduced. SOLUTION : The polishing agent for a synthetic quartz glass substrate is provided which includes a polishing particle and water, and in which the polishing particle includes a silica particle as a matrix particle carrying on the surface thereof at least one rare earth element selected from cerium, and other trivalent rear earth elements other than cerium. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2019, JPO&INPIT