Shielding apparatus of electrical particle for ultrahigh vacuum chamber and method thereof

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PURPOSE : An apparatus and a method for obstructing inflow of impurities into a high vacuum device are provided to reduce a time required to secure initial high vacuum of the device. CONSTITUTION : The apparatus for obstructing inflow of impurities into a high vacuum device comprises a support(1) located at the front side of the vacuum device with being connected to a door of the vacuum device; a positive electrode(3) and negative electrodes(4, 5) installed on the support to form an electric field; and a power source(6) for supplying electric power to the electrodes. The power source is constructed so that the positive pole thereof is connected with the positive electrode only and the negative pole keeps floating state so as to be earth to the negative electrodes, so the electrodes form weak elliptical electric field capable of obstructing the inflow of impurities inside the vacuum device. An insulation plate(7) is installed between the vacuum device and the support, and the power source uses 2 to 10 voltages.