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PROBLEM TO BE SOLVED : To manufacture a thin film having a smooth laminar structure which has been heretofore difficult to manufacture in a conventional method by suppressing the island structure produced when the film is extremely thin.
SOLUTION : The thin film having the laminar structure of a smooth surface, an underlayer thereof and a steep interface is manufactured by depositing the film and bombarding the surface region of a depth of ≤20 nm of the deposited film with the ions of rare gas which has an energy within a range from 100 to 300 eV and is heavier than Ne.