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The polyimide precursor resin composition, the cured film and manufacturing method thereof 发明授权

2023-09-05 3210 178K 0

专利信息

申请日期 2025-07-19 申请号 JP2014023520
公开(公告)号 JP6390109B2 公开(公告)日 2018-09-19
公开国别 JP 申请人省市代码 全国
申请人 日立化成デュポンマイクロシステムズ株式会社
简介 PROBLEM TO BE SOLVED : To provide a resin composition excellent in photocurability on a substrate having a copper wiring and from which a cured film has low stress.SOLUTION : There is provided a resin composition containing following (a) component, (b) component and (c) component : (a) a polyimide precursor having a structural unit represented by the following formula (1), where Ris a tetravalent organic group, Ris a bivalent organic group, Rand Rare each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 20 carbon atoms or a monovalent organic group having a carbon-carbon unsaturated double bond; (b) a photopolymerizable compound having an ethylenically unsaturated bond; (c) a triaryl imidazole dimer, a phosphine oxide compound or an alkylphenone compound.


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