客服热线:18202992950

METHOD FOR MANUFACTURING ALUMINA SUBSTRATE 发明申请

2023-02-09 1990 84K 0

专利信息

申请日期 2026-03-09 申请号 JP2018022079
公开(公告)号 JP2018111644A 公开(公告)日 2018-07-19
公开国别 JP 申请人省市代码 全国
申请人 TDK CORP
简介 PROBLEM TO BE SOLVED : To provide a method for manufacturing an alumina substrate capable of forming an AlN crystal having higher quality when forming the AlN crystal on the alumina substrate; a method for manufacturing an alumina substrate having an AlN layer having a reduced warp; and a method for manufacturing an alumina substrate capable of achieving a free-standing substrate by natural peeling when excessively applying stress caused by lattice mismatch inevitably occurring, when used as a seed substrate. SOLUTION : A method for manufacturing an alumina substrate includes the nitriding step of heating a rare earth element containing raw material, a basal alumina substrate 33 and carbon in a nitrogen atmosphere. In the nitriding step, an AlN layer 30 is formed on the surface of the basal alumina substrates in the vicinity of the surface of the basal alumina substrate 33 by replacing oxygen included in the basal alumina substrate with nitrogen, and a rare earth containing layer 31 and/or a region are formed in the inside of the AlN layer or an interface between the AlN layer and the basal alumina substrate. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2018, JPO&INPIT


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4