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ELECTRONIC DEVICE 发明申请

2023-02-05 2180 2112K 0

专利信息

申请日期 2025-07-23 申请号 KR1020180001832
公开(公告)号 KR1020180081467A 公开(公告)日 2018-07-16
公开国别 KR 申请人省市代码 全国
申请人 SK HYNIX INC; TOSHIBA MEMORY CORPORATION
简介 Provided are an electronic device and a manufacturing method thereof. According to one embodiment of the present invention, the electronic device includes a semiconductor memory capable of improving properties of a variable resistance element. The semiconductor memory comprises : a free layer having a changeable magnetization direction; a fixed layer having a fixed magnetization direction; and a tunnel barrier layer interposed between the free layer and the fixed layer. The free layer includes a first sub layer and a second sub layer having saturation magnetization (Ms) different with the first sub layer.COPYRIGHT KIPO 2018


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