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SPATTERING TARGET, METAL OXIDE PRODUCING METHOD, AND SPATTERING TARGET MANUFACTURING METHOD 发明申请

2023-09-03 2000 141K 0

专利信息

申请日期 2025-07-09 申请号 JP2016241243
公开(公告)号 JP2018095919A 公开(公告)日 2018-06-21
公开国别 JP 申请人省市代码 全国
申请人 SUMITOMO METAL MINING CO LTD
简介 PROBLEM TO BE SOLVED : To provide a sputtering target containing a rare-earth element as an auxiliary component element of a minute amount, a method for producing a metal oxide containing a rare-earth element, and a sputtering target manufacturing method.SOLUTION : A sputtering target contains a metal oxide expressed by the following formula 1, and contains a rare earth element homogeneously dispersed. In A1-xRexTiyO3---(Eq. 1) (In Eq. 1 : A : at least one kind of alkaline earth metal element; Re : at least one kind of rare-earth element; Ti : titanium; O : oxygen, 0


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