| 简介 |
PROBLEM TO BE SOLVED : To provide chamber lids and chamber nozzles having a plasma resistant protective layer of chamber component thin film for a processing chamber.
SOLUTION : A plasma resistant rare earth oxide film comprises : a ceramic body with at least one surface having a first average surface roughness of 8 to 16 micro inch; and a conformal protective layer over at least one surface of the ceramic body, the conformal protective layer comprising 40 to 100 mol% of Y2O3, 0 to 60 mol% of ZrO2, and 0 to 10 mol% of Al2O3. The conformal protective layer has a uniform thickness of less than 300 μm over the at least one surface and has a second average surface roughness of 10 micro inch or less. A chamber component for a processing chamber has a second average surface roughness that is smaller than a first surface roughness thereof.
SELECTED DRAWING : Figure 6
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