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ALUMINIUM ALLOY SPUTTERING TARGET 发明申请

2023-02-13 3700 154K 0

专利信息

申请日期 2026-04-24 申请号 JP2016232069
公开(公告)号 JP2018087371A 公开(公告)日 2018-06-07
公开国别 JP 申请人省市代码 全国
申请人 KOBELCO KAKEN : KK
简介 PROBLEM TO BE SOLVED : To provide an aluminium alloy sputtering target having an electric conductivity similar to that of a conventional aluminium alloy sputtering target and capable of reducing the occurrence of a flake. SOLUTION : An aluminium alloy sputtering target contains : at least one kind of an element selected from Ni, Cr, Fe, Co and Cu in 0.01 to 0.04 atomic% preferably 0.01 to 0.03 atomic%; and an element of at least one kind selected from rare earth elements other than La in 0.01 to 0.06 atomic%, preferably 0.03 to 0.05 atomic%, and the remainder is Al and an inevitable impurity. Said rare earth metal element is Y, Ce, Pr, Pm, Sm, Eu, Gd, Td, Dy and Yb. SELECTED DRAWING : None COPYRIGHT : (C)2018, JPO&INPIT


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