| 申请日期 | 2025-07-26 | 申请号 | JP2016232069 |
| 公开（公告）号 | JP6325641B1 | 公开（公告）日 | 2018-05-16 |
| 公开国别 | JP | 申请人省市代码 | 全国 |
| 申请人 | 株式会社コベルコ科研 | ||
| 简介 | Disclosed is an aluminum alloy sputtering target containing 0.01 atomic % to 0.04 atomic % in total of at least one element selected from the group consisting of Ni, Cr, Fe, Co and Cu, and 0.01 atomic % to 0.06 atomic % in total of at least one element selected from rare earth elements other than La, the balance being Al and inevitable impurities. | ||
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