| 简介 |
The present invention relates to a regeneration method of an IGZO sputtering target which can reduce consumption of a target material, which is a rare resource, by regenerating the target material in a target after the target is used in a sputtering process. Provided are the regeneration method of an IGZO sputtering target and a sputtering target regerated by the regeneration method, wherein an embodiment of the regeneration method comprises : a step of separating a target main body having a used portion from the used sputtering target from a backing plate; a step of polishing the surface having a used portion to produce a flat surface in the separated target main body; a step of joining a subplate to a new backing plate; and a step of joining the cut target main body on the subplate.COPYRIGHT KIPO 2018 |
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