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Radiation-sensitive resin composition, the resist pattern forming method, polymer, compound and i 发明授权

2023-05-05 2640 1112K 0

专利信息

申请日期 2025-07-22 申请号 JP2013075241
公开(公告)号 JP6273689B2 公开(公告)日 2018-02-07
公开国别 JP 申请人省市代码 全国
申请人 JSR株式会社
简介 PROBLEM TO BE SOLVED : To provide a radiation-sensitive resin composition excellent in EL (exposure latitude) performance, LWR (line width roughness) performance, CDU (critical dimension uniformity) performance and top-loss suppressing property.SOLUTION : The radiation-sensitive resin composition comprises [A] a polymer having a structural unit (I) expressed by formula (1) shown below and [B] a radiation-sensitive acid generator. In formula (1), Rto Reach independently represent a hydrogen atom, a monovalent linear hydrocarbon group having 1 to 6 carbon atoms or a monovalent alicyclic hydrocarbon group having 3 to 15 carbon atoms, or two or more groups in Rto Rare bonded to each other to constitute an alicyclic structure having 3 to 20 carbon atoms together with carbon atoms bonded to these groups.


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