| 简介 |
PROBLEM TO BE SOLVED : To provide a resist composition that enables production of a resist pattern with high resolution.SOLUTION : A resist composition contains a resin that has a structural unit represented by formula (I) and a structural unit represented by formula (a4) and does not have an acid-labile group, a resin having an acid-labile group, and an acid generator having an acid-labile group, wherein Rand Rare a hydrogen atom or a methyl group; Ris an alicyclic hydrocarbon group; Lis a divalent saturated hydrocarbon group or a single bond; and Ris a saturated hydrocarbon group having a fluorine atom. |
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