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Plasma Resistant Coating Layer, Method of Forming the Same 发明授权

2023-02-02 4900 531K 0

专利信息

申请日期 2025-07-08 申请号 KR1020150191355
公开(公告)号 KR101817779B1 公开(公告)日 2018-01-11
公开国别 KR 申请人省市代码 全国
申请人 (주)코미코
简介 The present disclosure relates to a plasma resistant coating film and a fabricating method thereof, more particularly a plasma resistant coating film and a fabricating method thereof which can secure chemical resistance by means of, after thermally spraying the first rare earth metal compound, double sealing through aerosol deposition and hydration, thereby minimizing open channels and open pores in the coating layer and plasma corrosion resistance by means of the dense rare earth metal compound coating film.


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