| 简介 |
PROBLEM TO BE SOLVED : To improve drawing precision, by calculating the height of the surface of a drawing object substrate with high precision.
SOLUTION : A charged particle beam lithography method includes a step of performing initial measurement of the height of the surface at multiple points of a substrate, a step of creating a first approximate surface from the results of initial measurement, a step of performing remeasurement of the surface height in a remeasurement region including a measuring point where the difference of the results of initial measurement and a first approximate surface goes above a predetermined value, a step of creating a second approximate surface from the results of remeasurement, and a step of combining the first and second approximate surfaces. At the time of drawing, substrate surface height of the drawing position is calculated from the approximate surface combining the first and second approximate surfaces, and the focal position of a charged particle beam is adjusted.
SELECTED DRAWING : Figure 1
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