客服热线:18202992950

Radiation-sensitive resin composition, the resist pattern formation method, the radiation-sensitiv 发明授权

2023-10-31 3900 1268K 0

专利信息

申请日期 2025-07-22 申请号 JP2014020843
公开(公告)号 JP6241303B2 公开(公告)日 2017-12-06
公开国别 JP 申请人省市代码 全国
申请人 JSR株式会社
简介 PROBLEM TO BE SOLVED : To provide a radiation-sensitive resin composition which is excellent in LWR performance, resolution, rectangularity of a cross-sectional shape, and depth of focus.SOLUTION : The radiation-sensitive resin composition of the present invention contains a polymer having a first structural unit containing an acid-dissociable group, and a first radiation-sensitive acid generator. The first radiation-sensitive acid generator comprises a compound represented by formula (1). In the formula (1), Rand Rare each independently a hydrogen atom, a fluorine atom, a 1-20C monovalent hydrocarbon group, or a 1-20C monovalent fluorinated hydrocarbon group, provided that at least one of Rand Ris a fluorine atom or a fluorinated hydrocarbon group.


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4