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Structure of thin film transistor, a thin film transistor and method of manufacturing semiconductor 发明授权

2023-03-25 1390 378K 0

专利信息

申请日期 2025-06-28 申请号 JP2014016632
公开(公告)号 JP6241848B2 公开(公告)日 2017-12-06
公开国别 JP 申请人省市代码 全国
申请人 国立研究開発法人物質・材料研究機構
简介 PROBLEM TO BE SOLVED : To provide a thin film transistor which is excellent in preventing diffusion of an impurity from a substrate to a semiconductor layer and inhibits deterioration in characteristics caused by the diffusion of the impurity.SOLUTION : A thin film transistor 10 comprises : a source electrode 60 and a drain electrode 70; a semiconductor layer 50 provided in contact with the source electrode and the drain electrode; a gate electrode 30 provided to correspond to a channel between the source electrode and the drain electrode; and insulator layers 41, 42 provided between the gate electrode and the semiconductor layer. The insulator layer is composed of a metal oxynitride containing Hf and a rare earth element, especially La.


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