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The curable composition, and method of forming the cured film, as well as base-generating agent 发明授权

2023-05-25 1610 521K 0

专利信息

申请日期 2025-06-28 申请号 JP2013210583
公开(公告)号 JP6237084B2 公开(公告)日 2017-11-29
公开国别 JP 申请人省市代码 全国
申请人 JSR株式会社
简介 PROBLEM TO BE SOLVED : To provide a curable composition having both storage stability and low temperature curing property, and allowing formation of a cured film excellent in solvent resistance.SOLUTION : A curable composition contains a base generator represented by at least one of the formulas (1-1) and (1-2), and a polymerizable compound. In the formulas (1-1) and (1-2), Rto Rare each independently a hydrogen atom, a halogen atom, an alkyl group, a nitro group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, an alkoxy group, an amino group, a mercapto group, a trialkylsilyl group, a silanol group, a sulfino group, a phosphate group, an acyl group, a trifluoromethyl group, a hydroxyl group, a cyano group, a nitro group, a carboxyl group, a sulfo group or the like.


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