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A composition for forming an organic semiconductor film, a non-luminescent organic semiconductor de 发明授权

2023-08-31 3360 2062K 0

专利信息

申请日期 2025-06-24 申请号 JP2014154286
公开(公告)号 JP6231448B2 公开(公告)日 2017-11-15
公开国别 JP 申请人省市代码 全国
申请人 富士フイルム株式会社
简介 PROBLEM TO BE SOLVED : To provide : a composition for organic semiconductor film formation which is high in carrier mobility and small in carrier mobility falling rate before and after a high-temperature heat annealing step when an organic semiconductor film is formed therefrom; a method for manufacturing an organic semiconductor film for nonluminous organic semiconductor devices; an organic semiconductor film for nonluminous organic semiconductor devices; a method for manufacturing an organic film transistor; and an organic film transistor.SOLUTION : A composition for organic semiconductor film formation comprises : a compound expressed by the general formula 1. (In the formula 1, T represents a condensed ring skeleton expressed by the general formula 2; W represents a group expressed by the general formula 3; k is 1-6; A, Band Crepresent a benzene ring, an azole ring, a furan ring, or a thiophene ring; k1 is 1-5; Rto Rrepresent a hydrogen atom, an alkyl group or the like; Rand R, and Rand Rare never bonded to form an aromatic ring; n1 is 0-3; Lis a particular divalent coupling group.)SELECTED DRAWING : None


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