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PARASITIC CHARGE CONTROL FOR III-N MATERIALS ON SILICON 发明申请

2023-01-14 3110 1204K 0

专利信息

申请日期 2025-08-19 申请号 WOUS17029437
公开(公告)号 WO2017192312A1 公开(公告)日 2017-11-09
公开国别 WO 申请人省市代码 全国
申请人 IQE PLC; CLARK Andrew; DARGIS Rytis; MARCHAND Hugues; LABOUTIN Oleg; KAO Chen Kai; LO Chien Fong; LEBBY Michael; PELZEL Rodney
简介 A structure can include a substrate layer with an interface and a carrier concentration at the interface, a rare earth oxide barrier layer grown over the substrate layer, and a Group III layer grown over the rare earth oxide barrier layer. The carrier concentration at the interface can be different by more than an order of magnitude than the bulk carrier concentration. The rare earth oxide layer can include a rare earth oxide material and can prevent diffusion of Group III species into the substrate layer. The Group III layer can include a Group III element.


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