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Metal oxide semiconductor thin film, thin film transistor, and their fabricating methods, and dis 发明授权

2023-07-19 4100 858K 0

专利信息

申请日期 2025-07-19 申请号 US15038127
公开(公告)号 US9806097B2 公开(公告)日 2017-10-31
公开国别 US 申请人省市代码 全国
申请人 BOE TECHNOLOGY GROUP CO LTD; SOUTH CHINA UNIVERSITY OF TECHNOLOGY
简介 A metal oxide semiconductor thin film, a thin film transistor (TFT), methods for fabricating the metal oxide semiconductor thin film and the TFT, and a display apparatus are provided. In some embodiments, the metal oxide semiconductor comprises : a first metal element, a second metal element and a third metal element, wherein : the first metal element is at least one of scandium, yttrium, aluminum, indium, and a rare earth element; the second metal element is at least one of calcium, strontium, and barium; and the third metal element is at least one of titanium and tin.


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