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Using the photosensitive resin composition of pigment dispersion liquid 发明授权

2023-04-17 4010 398K 0

专利信息

申请日期 2025-09-15 申请号 JP2013023600
公开(公告)号 JP6210691B2 公开(公告)日 2017-10-11
公开国别 JP 申请人省市代码 全国
申请人 東京応化工業株式会社
简介 PROBLEM TO BE SOLVED : To provide a pigment dispersion liquid having good dispersibility of a pigment after lapse of time and capable of giving a photosensitive resin composition even after lapse of time, the composition permitting formation of a micropattern with high adhesiveness at a low exposure dose, and to provide a production method of a photosensitive resin composition using the pigment dispersion liquid.SOLUTION : The pigment dispersion liquid comprises : a pigment; a solvent; and a compound expressed by formula (1) below. In the formula, Rand Reach independently represent a hydrogen atom or an organic group, however, at least one of them represents an organic group, and Rand Rmay be bonded to form a cyclic structure and may include a bond of hetero atoms; Rrepresents a single bond or an organic group; Rto Reach independently represent a hydrogen atom, an organic group or the like, however, Rand Rare inhibited from being a hydroxyl group; and Rrepresents a hydrogen atom or an organic group.


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