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SUBSTRATE WITH MEMBRANE, COMPONENT FOR PLASMA ETCHING DEVICE, AND THEIR MANUFACTURING METHOD 发明申请

2023-02-25 2290 479K 0

专利信息

申请日期 2025-06-26 申请号 JP2016062012
公开(公告)号 JP2017172021A 公开(公告)日 2017-09-28
公开国别 JP 申请人省市代码 全国
申请人 RIVERSTONE KOGYO KK
简介 PROBLEM TO BE SOLVED : To provide a substrate with a membrane having a thermal spray coating on the surface of the substrate, which is high in a plasma resistance, hard to leave, excellent in an acid resistance, and high in a surface resistance value. SOLUTION : A substrate with a membrane has a membrane on the surface of a substrate. Said membrane has a thickness of 10 to 1000 μm, contains a fluoride and an oxide of a rare earth element (Ln) as main components, being the oxide of the rare earth element (Ln) as a main component on the surface of the membrane, and has a monoclinic crystal structure and contains particulate portion [α] of a predetermined diameter, a fluoride of a rare earth element (Ln) as a main component, and has an orthorhombic structure. A particular portion [β] of a specific diameter exists while dispersing in the matrix of amorphous containing a fluoride of the rare earth element (Ln) as a main component. If the surface of said membrane is observed by using an optical microscope, moreover, a white stain-like portion is confirmed, and an area ratio of this stain-like portion in an observation visual field is low. SELECTED DRAWING : Figure 1 COPYRIGHT : (C)2017, JPO&INPIT


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