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Alumina substrate 发明申请

2023-10-22 2730 1454K 0

专利信息

申请日期 2025-07-05 申请号 KR1020177022339
公开(公告)号 KR1020170106375A 公开(公告)日 2017-09-20
公开国别 KR 申请人省市代码 全国
申请人 TDK CORP
简介 An alumina substrate on which an AlN layer is formed and that causes less warping, and a substrate material strong enough to withstand normal handling when an AlN crystal is grown upon it, and prevents cracking and fracturing of a grown crystal when stress is applied during growing or cooling. The substrate has a gap and a rare earth element-containing region inside the AlN layer or at the interface between the AlN layer and the alumina substrate. Warping of the AlN layer can be reduced by lattice-mismatch stress being concentrated at the region and releasing of stress by the gap. The region having a concentrating of stress, and the gap having a low mechanical strength, can induce crackings and fracturings. As a result, contamination of crackings and fracturings into the crystal grown on the substrate can be prevented. The region can ensure a level of mechanical strength sufficient for handling.


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