| 简介 |
PROBLEM TO BE SOLVED : To provide a method for advantageously manufacturing an oxidation color development electrochromic thin film excellent in electrochemical characteristics in cost.
SOLUTION : The method for manufacturing an oxidation color development electrochromic thin film includes the DC sputtering step of performing DC sputtering in a mixed gas atmosphere of rare gas and vapor using metal or a metal compound used as the material of an electrochromic thin film as a target. A composition ratio of the vapor to the mixed gas is preferably 0.4-0.7, more preferably 0.45-0.6, or may be more than 0.7 and less than 1, more preferably 0.9-0.99. An argon gas is preferable as the rare gas, and at least one kind selected from Ni, Ir, Rh, Cr, Fe or In is preferable as a metal element constituting the metal or metal compounds of the target.
SELECTED DRAWING : Figure 1
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