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ULTRAVIOLET REFLECTION FILM, AND SPUTTERING TARGET 发明申请

2023-10-27 1110 153K 0

专利信息

申请日期 2025-06-27 申请号 JP2016021086
公开(公告)号 JP2017137549A 公开(公告)日 2017-08-10
公开国别 JP 申请人省市代码 全国
申请人 KOBELCO KAKEN : KK
简介 PROBLEM TO BE SOLVED : To provide an ultraviolet reflection film given a reflectivity of 85% or higher for an ultraviolet ray of a wavelength 254 nm by controlling the quantities of a rare earth element and Cu constituting an ultraviolet ray reflective film, and the quantity of Al of the reminder, and the ratio of the rare earth metal and Cu, to predetermined ranges. SOLUTION : An ultraviolet reflection film contains one or two kinds or more of rare earth elements : 0.2 to 3.0 at% or Cu : 0.2 to 6.0 at%, the remainder containing Al and an inevitable impurity, satisfying formula (1), the reflective index of an ultraviolet ray of a wavelength 254 nm being 85% or more. X+0.5Y<3.5 ... (1) [X designates the quantity [at %] of a rare earth element; Y designates the quantity [at %] of Cu]; said rare earth element is one or more elements selected from Sc, Nd, Gd, La, Y, Ce, Pr or Dy; and the film thickness is 50 to 2000 nm. SELECTED DRAWING : None COPYRIGHT : (C)2017, JPO&INPIT


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