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The Faraday rotator manufacturing method 发明授权

2023-08-17 1640 376K 0

专利信息

申请日期 2025-07-31 申请号 JP2014035451
公开(公告)号 JP6164118B2 公开(公告)日 2017-07-19
公开国别 JP 申请人省市代码 全国
申请人 住友金属鉱山株式会社
简介 PROBLEM TO BE SOLVED : To provide a method for manufacturing a Faraday rotator that prevents a bismuth-substituted rare-earth iron garnet crystal film (RIG film) from breaking or the like during manufacturing, makes accuracy of a Faraday rotation angle high, and makes the Faraday rotator hardly increase insertion loss even if it is applied to a high-power optical isolator.SOLUTION : A method for manufacturing a Faraday rotator includes : a first step of raising a RIG film 1-1 on a nonmagnetic garnet substrate (raising substrate) 2-1, and processing the RIG film into a planar shape by grinding and polishing it; a second step of attaching a first heat radiation substrate 3-1 to the RIG film processed into the planar shape by using optical adhesive and removing the adhesive by grinding the raising substrate without curing the adhesive, grinding and polishing the exposed RIG film, and setting it to a desired Faraday rotation angle; a third step of attaching a second heat radiation substrate to the RIG film at the side of the raising substrate being removed by using the adhesive; and a fourth step of curing the adhesive after attaching the first heat radiation substrate and the second heat radiation substrate to both surface sides of the RIG film.


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